PROCESS CONTROL SOLUTIONS Applied Materials' Process Control solutions include:Advanced Process Control (APC) – Applied Materials' APC applications detect and identify process and product deviations and make changes automatically to improve operations. The two major components of APC are run-to-run (R2R) control and Fault Detection and Classification (FDC). R2R control is a discrete process control scenario in which the product recipe is modified before the start of processing so as to minimize process drift, shift and variability. This process increases control capability and reduces product scrap. FDC is an application used to perform tool, process and product health monitoring and diagnosis. Statistical Process Control (SPC) – SPC only detects results of process deviations through statistical means. Applied Materials' SPC application is integrated as a module within the MES system to allow immediate actions to be taken when an out-of-control condition is detected by the SPC server.
APC Platform
Fault Detection and Classification (FDC)
Run-2-Run (R2R)
Run-2-Run (R2R) for CMP
Run-2-Run (R2R) for Etch Process
Run-2-Run (R2R) for Lithography
Sentinel
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